The F7000 is an EB lithography tool with superior resolution performance meeting requirements for the 1Xnm technology node. The F7000 supports substrates of diverse materials, sizes, and shapes, including nano-imprint templates, as well as wafers, and is optimized for diverse applications such as advanced LSIs, photonics, MEMS, and other nano-processes. Also, users can select the configuration optimal for their needs, either stand-alone or in-line, enabling the F7000 to support a wide array of applications from R&D to volume production
- 1Xnm resolution performance
- Character Projection (CP) lithography
- High throughput
- Supports substrates of diverse sizes, shapes and materials
- Lab to Fab flexible configuration
- Proprietary Self-Cleaning technology for better stability
- Small footprint
Resolution | 1Xnm |
---|---|
Supported substrates | Wafer (300mm, 200mm, 6 to 3inch), Glass substrate (6025) |
Lithography method | CP, VSB |